陳金平，男，2000年7月畢業于山東大學化學學院，獲理學學士學位；2000年9月—2005年7月就讀于中國科學院理化技術研究所，獲理學博士學位，畢業后留所工作，任助理研究員；2007年4—2009年3月，受日本學術振興會(JSPS)的資助，在日本京都大學大須賀(Atsuhiro Osuka)實驗室從事博士后研究工作，2009年4月回國，現任中國科學院理化技術研究所研究員，博士生導師。入選2009年度北京市科技新星（B類），首屆中國科學院青年創新促進會會員（2011年），優秀會員（2015年），理化所優秀員工（2021年）。主要從事高檔光刻膠的研發與產業化工作，主持或參與02重大專項、國家自然科學基金重大/面上項目、中科院科技專項等項目，在J. Am. Chem. Soc.、ACS?Appl. Mater. Interfaces、 J. Mater. Chem. C 等學術刊物上發表學術論文100余篇，申請光刻膠發明專利54項（授權23項）。
新型超高分辨光刻膠材料體系、光刻機理和工藝研究；
特種光刻膠材料體系的開發與應用研究；
有機功能化合物合成及光物理性質研究。
作為項目（子課題）負責人先后承擔（參與）國家科技重大專項（02專項）、財政部重大科研裝備研制項目、中科院先導項目、自然基金重大項目（課題）等。
1.?Rongrong Peng, Peng Lian, Jinping Chen*, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Jun Zhao, Yanqing Wu,Guoqiang Yang* and Yi Li*, ‘Lithographic performances of aryl sulfonate ester modified polystyrene as nonchemically amplified resists’?Ind. Chem. Mater.,?2025, 3, DOI: 10.1039/d5im00046g
2.?Rongrong Peng, Jinping Chen*, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Jun Zhao, Yanqing Wu, Yasin Ekinci,* Guoqiang Yang*, Yi Li*,?‘Nonchemically-amplified molecular resists based on calixarene derivatives enabling 14 nm half-pitch nanolithography’ Chin. J. Chem.?2025, 43(13), 1513-1522 (Front Cover).
3.?Zhuoran Liu, Jinping Chen*, Tianjun Yu, Yi Zeng,?Xudong Guo, Shuangqing Wang, Rui Hu, Michaela Vockenhuber, Peng Tian, Dimitrios Kazazis, Yasin Ekinci,* Guoqiang Yang*, Yi Li*,?‘Performance Optimization of Sulfonium-Functionalized Molecular Resists for EUV and Electron Beam Lithography’ ACS Appl. Electron Mater., 2025,?7?(6), 2640-2649.?
4.?Xiaodong Yuan, Jinping Chen*, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci,* Jun Zhao, Yanqing Wu, Guoqiang Yang*, Yi Li*,?‘Nonchemically Amplified Molecular Resist based on Multi-sulfonium Modified Triptycene for Electron beam and Extreme Ultraviolet Lithography’ J. Micro/Nanopattern. Mater. Metrol.?2024, 23(3), 034601.
5.?Huiwen An, Jinping Chen*, Yi Zeng, Tianjun Yu, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci*, Guoqiang Yang*, Yi Li*,?‘Increasing the Sensitivity of Nonchemically-Amplified Resists by Oxime Sulfonate Functionalized Polystyrene’ ACS Appl. Polym. Mater., 2024, 6(9), 5374–5384.
6.?Yake Wang, Jinping Chen*, Yi Zeng, Tianjun Yu, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci,* Yanqing Wu, Shumin Yang, Jun Zhao, Guoqiang Yang,* and Yi Li*, Nonchemically Amplified Molecular Resists Based on Sulfonium-Functionalized Sulfone Derivatives for Sub-13 nm Nanolithography’ ACS Appl. Nano Mater., 2023, 6?(19), 18480-18490.
7.?Zhihao Wang, Jinping Chen*, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Timothée Allenet, Michaela Vockenhuber, Yasin Ekinci*, Guoqiang Yang*, ?Yi Li*, ‘Sulfonium-Functionalized Polystyrene Based Non-chemically Amplified Resists Enabling sub-13 nm Nanolithography’ ACS Appl. Mater. Interfaces, 2023, 15?(1), 2289-2300.
8.?Shengwen Hu, Jinping Chen*, Tianjun Yu, Yi Zeng,?Xudong Guo, Shuangqing Wang, Guoqiang Yang*, Yi Li*, Photoresists Based on Bisphenol A Derivatives with tert-Butyl Ester Groups for Electron Beam Lithography J. Photochem. Photobiol. A Chem. 2023,?436, 114351.
9.?Shengwen Hu, Jinping Chen*, Tianjun Yu, Yi Zeng,?Shuangqing Wang, Xudong Guo, Guoqiang Yang*, Yi Li*, A Novel Dual-tone Molecular Glass Resist Based on Adamantane Derivatives for Electron Beam Lithography. J. Mater. Chem. C 2022,?10, 9858-9866.
10.?Zhihao Wang, Jinping Chen*, Tianjun Yu, Yi Zeng, Guoqiang Yang*, Timothee Allenet, Vockenhuber Michaela, Ekinci Yasin, Yi Li*, Water Developable Non-chemically Amplified Photoresist for Electron Beam and Extreme Ultraviolet Lithography. J. Micro/Nanopattern. Mater. Metrol.?2022,?21(4),?
1）北京市科技新星（2009）?
2）中國科學院青年創新促進會會員（2011）?
3）中國科學院光化學轉換與功能材料重點實驗室學術報告特等獎（2013）?
4）理化青年論壇青年學術報告優秀獎(2014)?
5)??中國科學院青年創新促進會優秀會員（2015）
6）中國科學院理化技術研究所優秀員工（2021）
人才隊伍